OKI Delivers Additional Exhaust Gas Treatment Equipmentfor ON Semiconductor’s European plants

OKI Engineering, provider of reliability evaluations and environmental conservation technologies for the OKI Group, recently delivered an additional unit of KGT-3MM-AP exhaust gas treatment equipment for atmospheric pressure CVD(*1) manufacturing equipment to semiconductor manufacturer ON Semiconductor’s European plants. OKI Engineering’s exhaust gas treatment equipment adopt a filter designed to minimize filter clogging, allowing extended maintenance-free use, ultimately contributing to production efficiency and helping to maintain the semiconductor manufacturers’ production environment.

Thus, it ensures reliability and consistency in the CVD thin film manufacturing line, ultimately helping to maintain the customer’s production environment.

In the manufacture of power devices such as Power FET(*2) and IGBT(*3) atmospheric pressure CVD manufacturing equipment is vital at the stage of insulating film manufacture. However, this equipment uses harmful gases and requires exhaust gas processing.

OKI Engineering ’s KGT-3MM-AP exhaust gas treatment contains a special stainless steel filter, which minimizes filter clogging and helps remove the harmful gases and particulate matter used with atmospheric pressure CVD manufacturing equipment. This extends maintenance-free use, improve scrubbing efficiency. The micromanometer used for pressure control was designed specifically for CVD gas use. Inverter control for the exhaust fan ensures the constant exhaust pressure essential for atmospheric pressure CVD thin film manufacture and extended operational reliability and consistency.

OKI Engineering has added a newly developed function as an option, which resets abnormalities in the atmospheric pressure CVD equipment by detecting pressure abnormality occurred during maintenance, in turn, enhancing customer satisfaction.

Moving forward, OKI Engineering will expand reach into Europe and new regions including Southeast Asia.

• Environmental system technology

• *1 CVD

  CVD (chemical vapor deposition) is a vapor deposition method for producing thin films using various materials on a heated substrate.

• *2 Power FET

  A power FET (power field-effect transistor) is a MOSFET(*4) designed to handle high power. Offering faster switching and higher conversion efficiency in low-voltage ranges than other power devices, power FETs are used in applications such as switching power supplies and DC-DC converters up to 200 V.

• *3 IGBT

  Used in power control applications, an IGBT (Insulated Gate Bipolar Transistor) is a semiconductor device in the form of a bipolar transistor incorporating a MOSFET for the gate.

• *4 MOSFET

  MOSFET (metal-oxide semiconductor field-effect transistor) is a type of field-effect transistor (FET) and the most common device currently used in LSIs. Silicon is the material used most often.

Founded in 1881, OKI Electric Industry is Japan’s leading telecommunications manufacturer in the Info-telecom field. Headquartered in Tokyo, Japan, OKI provides top-quality products, technologies, and solutions to customers through its info-telecom systems and printer operations. Its various business divisions function synergistically to bring to market exciting new products and technologies that meet a wide range of customer needs in various sectors. Visit OKI’s global website at http://www.oki.com/.

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